The BWS Sputtering System is a fully customizable state-of-the-art physical vapor deposition system designed for the synthesis of high quality thin films and thin film research.

The Sputtering System machines offers a variety of built-in and custom features such as: optimized 3-gun flange, substrate heater, pressure adjustment, and is designed for easy integration with a variety of other deposition techniques and sources such as: PLD, Thermal Evaporation & CVD, E-beam, and more.

  • Description
  • Specification
  • Brochure
  • Photos
  • Videos

Product Description

Applications

  • Optical Transparent Coatings
  • Oxide and Nitride Coatings
  • Die-electric (low or high-k) Coatings
  • Metallic Coatings
  • Multilayer thin films and devices

Features

  • Customizable stainless steel reactor chamber
  • Compact PVD system design for easy transport

Custom Options Available:

  • Custom flange for up to 3 sputtering gun design for quick changing of the deposition material
  • BWS rotating substrate heater capable of reaching temperatures up to 800°C (900°C for the fixed or non-rotatable design)
  • Optional linear motion z-stage for vertical axis adjustment of the substrate
  • Optional load lock with gate valve and transfer arm for easy sample removal
  • Turbo/Cryopump
  • Optional automated system control via La bView software
  • 10″ quick access door for sample transfer

Product Specification

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Brochure

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Photos

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Videos

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