Inconel Substrate Heater
Oxidation and chemical resistant metal alloy heater designed to reach temperatures up to 900°C. Built for precision temperature control and uniform heating, the Inconel Substrate Heater is the perfect tool for a variety of thin film applications.
- Description
- Specification
- Brochure
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Product Description
The Inconel Substrate Heater is an oxygen compatible heater designed for thin film oxide based processes and vacuum applications such as: pulsed laser deposition(PLD), reactive sputtering, chemical vapor deposition(CVD), thermal evaporation, and more. With precision temperature control and heating uniformity, these heaters are the perfect tool for deposition of thin film materials.
Applications
- Vacuum Annealing, Doping, Catalytic Reaction
- In-Situ Surface Science, R & D
- Gas Sensor Temperature dependent Characterization
- Epitaxy of Oxides, Nitrides, Carbides, Metals\
Key Features
- Operating temperatures up to 850°C
- Compatible with reactive gases such as O2, NH3, SiH4, CH4
- Vacuum compatibility from 10-8 Torr to 10-1 Torr
- Oxidation, corrosion, and chemical resistant inconel alloy material
- Heating element collar for element protection
Product Specification
Specifications
- Maximum temperature of operation up to 900°C
- Vacuum compatibility 10-8-10-7Torr
- Integrated in-built k-type temperature sensor thermocouple with extended flexible and insulated thermocouple wires
- Flexible glass fiber insulated wire conductors for powering
- Inconel collar with tapped holes for substrate clamping
- Available sizes From 0.5” to 6” diameter
- Bias capability
- Precision temperature
- PID controlled power supply 110V-220V
- Easy to Install
Brochure
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Photos
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Videos
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